Atomic Layer Deposition of the Solid Electrolyte LiPON

Type:

Journal

Info:

Chem. Mater. 2015, 27, 5324-5331

Date:

2015-07-09

DOI:

http://dx.doi.org/10.1021/acs.chemmater.5b01654

Author Information

Name	Institution
Alexander Campbell Kozen	University of Maryland
Alexander J Pearse	University of Maryland
Chuan-Fu Lin	University of Maryland
Malachi Noked	University of Maryland
Gary W. Rubloff	University of Maryland

Films

Other LiPON

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji

LiOt-Bu, LiOtBu, LTB, Lithium tert-butoxide, Lithium tertiary butoxide, LiOC₄H₉

CAS#: 1907-33-1

H₂O, Water

CAS#: 7732-18-5

Trimethyl phosphate, TMP, (MeO)₃PO

CAS#: 512-56-1

N₂, Nitrogen

CAS#: 7727-37-9

Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Thickness

Analysis: Ellipsometry

Diagnostic: J.A. Woollam M-2000D

Characteristic: Chemical Composition, Impurities

Analysis: XPS, X-ray Photoelectron Spectroscopy

Diagnostic: Kratos Analytical Axis Ultra DLD

Characteristic: Morphology, Roughness, Topography

Analysis: AFM, Atomic Force Microscopy

Diagnostic: NT-MDT NTEGRA Spectra

Characteristic: Images

Analysis: SEM, Scanning Electron Microscopy

Diagnostic: Hitachi SU-70

Characteristic: Images

Analysis: TEM, Transmission Electron Microscope

Diagnostic: JEOL 2100

Substrates

Silicon
Stainless Steel
CNTs, Carbon NanoTubes

Notes

378

Inductively coupled plasma sources from Plasma ALD, LLC.

Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.