A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
Info:
Surface and Coatings Technology Volume 213, December 2012, Pages 183-191
Author Information
Films
Film/Plasma Properties
Analysis: SEM, Scanning Electron Microscopy
Analysis: QMS, Quadrupole Mass Spectrometer
Analysis: OES, Optical Emission Spectroscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Analysis: TEM, Transmission Electron Microscope
Analysis: XRF, X-Ray Fluorescence
Substrates
| ZnO |
| Stainless Steel |
| Ti |
| Glass |
Notes
| Custom rotary PEALD system demonstrated with variety of films on different particles. |
| 181 |