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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

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Davy Deduytsche Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Davy Deduytsche returned 15 record(s).

NumberTitle
1Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
2Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
3Texture of atomic layer deposited ruthenium
4TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
5Atomic layer deposition of titanium nitride from TDMAT precursor
6A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
7Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
8Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
9Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
10Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
11Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
12Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
13Ru thin film grown on TaN by plasma enhanced atomic layer deposition
14Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
15Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality