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Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing

Type:
Journal
Info:
J. Vac. Sci. Technol. A 32(1), Jan/Feb 2014, 01A123
Date:
2013-11-30
DOI:
http://dx.doi.org/10.1116/1.4847976

Author Information

Name Institution
Shaoren DengGhent University
Sammy W. VerbruggenUniversity of Antwerp
Silvia LenaertsUniversity of Antwerp
Johan A. MartensKU Leuven
Sven Van den BergheSCK-CEN
Kilian Devloo-CasierGhent University
Wouter DevulderGhent University
Jolien DendoovenGhent University
Davy DeduytscheGhent University
Christophe DetavernierGhent University

Films

Thermal TiO2

Hardware used: Custom Remote
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 150C

Plasma TiN

Hardware used: Custom Remote
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
NH3, Ammonia
CAS#: 7664-41-7
Deposition Temperature = 150C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: UV-Vis Transmission
Analysis: Custom
Diagnostic: -

Characteristic: Band Gap
Analysis: Tauc Plotting
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Discover

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Bruker D8 Discover

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Dimension Edge

Characteristic: Photocatalytic Activity
Analysis: -
Diagnostic: -

Substrates

Si(100)
Quartz

Notes

Anneals
7