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Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor

Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2014, 6 (10), pp 7316-7324
Date:
2014-04-29
DOI:
http://dx.doi.org/10.1021/am5007222

Author Information

Name Institution
Delphine LongrieGhent University
Davy DeduytscheGhent University
Jo HaemersGhent University
Philippe F. SmetGhent University
Kris DriesenUmicore
Christophe DetavernierGhent University

Films

Thermal TiN

Hardware used: Custom Rotary
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
NH3, Ammonia
CAS#: 7664-41-7
Deposition Temperature = 150C

Plasma TiN

Hardware used: Custom Rotary
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
NH3, Ammonia
CAS#: 7664-41-7
Deposition Temperature = 150C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: JEOL JSM-7600F

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL JSM-7600F

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: Hiden Analytical QMS

Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: Ocean Optics HR2000+

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Surface Science Instruments

Characteristic: Resistivity, Sheet Resistance
Analysis: Resistivity Meter
Diagnostic: Loresta GP MCP-T610

Characteristic: Thickness
Analysis: XRF, X-Ray Fluorescence
Diagnostic: Bruker Artax

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Tecnai G2 F30

Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: HAADF, High-Angle Annular Dark Field
Diagnostic: -

Substrates

ZnO

Notes

Custom rotary PEALD and thermal ALD TiN on particles.
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