Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
Info:
Korean J. Mater. Res. Vol. 27, No. 6 (2017)
Author Information
Films
Film/Plasma Properties
Analysis: XRD, X-Ray Diffraction
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: AFM, Atomic Force Microscopy
Analysis: TEM, Transmission Electron Microscope
Analysis: UV-VIS Spectroscopy
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Substrates
Notes
| Paper written in Korean with extra English version of abstract and English figure descriptions and labels. |
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