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Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition

Type:
Journal
Info:
Appl. Phys. Express 13 087001
Date:
2020-07-20
DOI:
http://dx.doi.org/10.35848/1882-0786/aba7a5

Author Information

Name Institution
Daiki IshiTokyo Metropolitan University
Yuichiro EzoeTokyo Metropolitan University
Kumi IshikawaJapan Aerospace Exploration Agency
Masaki NumazawaTokyo Metropolitan University
Aoto FukushimaTokyo Metropolitan University
Ryota OtsuboTokyo Metropolitan University
Hikaru SuzukiTokyo Metropolitan University
Tatsuya YuasaTokyo Metropolitan University
Sae SakudaTokyo Metropolitan University
Tomoki UchinoTokyo Metropolitan University
Maiko FujitaniTokyo Metropolitan University
Kazuhisa MitsudaJapan Aerospace Exploration Agency
Mark J. SowaVeeco Instruments

Films

Thermal Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 250C

Plasma Pt

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt
CAS#: 94442-22-5
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: Profilometry
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Substrates

Silicon
Al2O3

Notes

1595