About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Atomic Layer Deposition of Gold Metal

Type:
Journal
Info:
Chem. Mater.
Date:
2015-12-28
DOI:
http://dx.doi.org/10.1021/acs.chemmater.5b04562

Author Information

Name Institution
Matthew B. E. GriffithsCarleton University
Peter J. PallisterCarleton University
David J. MandiaCarleton University
Sean T. BarryCarleton University

Films

Other Au

Hardware used: Picosun R200
Trimethylphosphino Trimethyl Gold(III), Trimethyl Trimethylphosphine Gold(III)
CAS#: 33012-33-8
O2, Oxygen
CAS#: 7782-44-7
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 120C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: -

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Precursor Characterization
Analysis: TGA, Thermo Gravimetric Analysis
Diagnostic: TA Instruments Q500 with EGA furnace

Characteristic: Precursor Characterization
Analysis: Vapor Pressure
Diagnostic: TA Instruments Q500 with EGA furnace

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Tescan Vega-II XMU

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Tescan Vega-II XMU

Substrates

Si(100)
Glass

Notes

443