Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Trimethylphosphino Trimethyl Gold(III), Trimethyl Trimethylphosphine Gold(III), CAS# 33012-33-8

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Atomic Layer Deposition of Gold Metal
2Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature