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Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature

Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2019, 11 (40), pp 37229-37238
Date:
2019-09-16

Author Information

Name Institution
Michiel Van DaeleGhent University
Matthew B. E. GriffithsGhent University
Ali RazaGhent University
Matthias M. MinjauwGhent University
Eduardo SolanoALBA Synchrotron Light Source, NCD-SWEET Beamline
Ji-Yu FengGhent University
Ranjith K. RamachandranGhent University
Stephane ClemmenGhent University
Roel BaetsGhent University
Sean T. BarryCarleton University
Christophe DetavernierGhent University
Jolien DendoovenGhent University

Films

Plasma Au


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Thickness
Analysis: XRF, X-Ray Fluorescence

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering

Characteristic: Surface Enhancement
Analysis: SERS, Surface Enhanced Raman Scattering

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Substrates

Si(100)
SiO2
Au

Notes

1683