Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
Type:
Journal
Info:
APPLIED PHYSICS LETTERS 102, 173501 (2013)
Date:
2013-04-29
Author Information
| Name | Institution |
|---|---|
| Alexander Campbell Kozen | University of Maryland |
| Marshall A. Schroeder | University of Maryland |
| Kevin D. Osborn | University of Maryland |
| C. J. Lobb | University of Maryland |
| Gary W. Rubloff | University of Maryland |
Films
Thermal Al2O3
Thermal Al2O3
Plasma Al2O3
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Characteristic: Dielectric Constant, Permittivity
Analysis: I-V, Current-Voltage Measurements
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
| Al |
Notes
| Discuss Electron BackScatter Detection (EBSD) and Elastic Recoil Detection (ERD) but not sure what they were used for. |
| 61 |