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Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition

Type:
Journal
Info:
Chem. Mater. 2015, 27, 148-156
Date:
2014-12-04
DOI:
http://dx.doi.org/10.1021/cm503659d

Author Information

Name Institution
Il-Kwon OhYonsei University

Films

Plasma Er2O3

Hardware used: NCD Technology Lucida MP-100
Bis-methylcyclopentadienyl-diisopropylacetamidinate-erbium, (Er(MeCp)2(N-iPr-amd))
CAS#: 0-0-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 150-300C

Thermal Er2O3

Hardware used: NCD Technology Lucida MP-100
Bis-methylcyclopentadienyl-diisopropylacetamidinate-erbium, (Er(MeCp)2(N-iPr-amd))
CAS#: 0-0-0
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range = 130-330C

Plasma Dy2O3

Hardware used: NCD Technology Lucida MP-100
bis-isopropylcyclopentadienyl-diisopropyl-acetamidinate-dysprosium (Dy(iPrCp)2(N-iPr-amd))
CAS#: 0-0-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 140-330C

Thermal Dy2O3

Hardware used: NCD Technology Lucida MP-100
bis-isopropylcyclopentadienyl-diisopropyl-acetamidinate-dysprosium (Dy(iPrCp)2(N-iPr-amd))
CAS#: 0-0-0
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

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