Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Bis-methylcyclopentadienyl-diisopropylacetamidinate-erbium, (Er(MeCp)2(N-iPr-amd)), CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition