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Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization

Type:
Journal
Info:
Chem. Mater. 2017, 29, 2090-2100
Date:
2017-02-23
DOI:
http://dx.doi.org/10.1021/acs.chemmater.6b04368

Author Information

Name Institution
René H. J. VervuurtEindhoven University of Technology
Bora KarasuluEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology

Films

Other Al2O3

Hardware used: Oxford Instruments FlexAL
O2, Oxygen
CAS#: 7782-44-7
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 100C

Other Al2O3

Hardware used: Oxford Instruments FlexAL
H2, Hydrogen
CAS#: 1333-74-0
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Diagnostic: Renishaw Invia Raman

Characteristic: Mobility
Analysis: Hall Measurements
Diagnostic: Ecopia HMS-5300

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific KA1066 spectrometer

Characteristic: Uniformity
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL 7500F

Characteristic: Uniformity
Analysis: AFM, Atomic Force Microscopy
Diagnostic: NT-MDT Solver P47SPM

Characteristic: Uniformity
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL JEM ARM 200

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL JEM ARM 200

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000D

Substrates

Graphene

Notes

1143