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Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide

Type:
Journal
Info:
J. Phys. Chem. C, 2014, 118(48), pp 27749-27753
Date:
2014-11-06
DOI:
http://dx.doi.org/10.1021/jp509298r

Author Information

Name Institution
Alexander Campbell KozenUniversity of Maryland
Alexander J PearseUniversity of Maryland
Chuan-Fu LinUniversity of Maryland
Marshall A. SchroederUniversity of Maryland
Malachi NokedUniversity of Maryland
Sang Bok LeeUniversity of Maryland
Gary W. RubloffUniversity of Maryland

Films

Thermal Li2O

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
LiOt-Bu, LiOtBu, LTB, Lithium tert-butoxide, Lithium tertiary butoxide, LiOC4H9
CAS#: 1907-33-1
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range = 240-300C

Plasma Li2O

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
LiOt-Bu, LiOtBu, LTB, Lithium tert-butoxide, Lithium tertiary butoxide, LiOC4H9
CAS#: 1907-33-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 225-300C

Thermal LiOH

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
LiOt-Bu, LiOtBu, LTB, Lithium tert-butoxide, Lithium tertiary butoxide, LiOC4H9
CAS#: 1907-33-1
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 225C

Plasma Li2CO3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
LiOt-Bu, LiOtBu, LTB, Lithium tert-butoxide, Lithium tertiary butoxide, LiOC4H9
CAS#: 1907-33-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 225-300C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Kratos Analytical Axis Ultra DLD

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000D

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Substrates

Silicon

Notes

Ultratech Fiji (PE)ALD Li2O, LiOH, and Li2CO3 for Li-ion battery electrode study.
TEM images in supplemental materieals.
Silicon substrates cleaned with acetone, methanol, IPA, and N2.
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