Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 050904 (2019)
Date:
2019-08-09
Author Information
| Name | Institution |
|---|---|
| Jeroen Kint | Ghent University |
| Felix Mattelaer | Ghent University |
| Matthias M. Minjauw | Ghent University |
| Bo Zhao | Ghent University |
| Christophe Detavernier | Ghent University |
Films
Thermal SnO2
Plasma Fe2O3
Other FeSnO
Hardware used: Custom Remote Inductively Coupled Plasma
CAS#: 1316-98-9
CAS#: 7782-44-7
CAS#: 7732-18-5
Film/Plasma Properties
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: XRF, X-Ray Fluorescence
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Electrochemical Performance
Analysis: Custom
Substrates
| SiO2 |
| Pt |
Notes
| 1510 |