About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

SnO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing SnO2 films returned 33 record(s).

NumberTitle
1SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
2Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
3Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
4Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
5Understanding and Eliminating Hysteresis for Highly Efficient Planar Perovskite Solar Cells
6Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
7Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
8Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
9Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
10Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
11Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
12Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
13Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
14Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
15A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
16Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
17Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
18Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
19Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
20Surface and sensing properties of PE-ALD SnO2 thin film
21Growth of ZnO nanorods on fluorine-doped tin oxide substrate without catalyst by radio-frequency magnetron sputtering
22Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
23Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
24In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
25Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
26Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
27A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
28Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
29Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
30Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
31Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
32Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
33Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma