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Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level

Type:
Journal
Info:
Applied Surface Science 563 (2021) 150400
Date:
2021-06-14
DOI:
https://doi.org/10.1016/j.apsusc.2021.150400

Author Information

Name Institution
Hongyan XuNorth University of China
Mohammad Karbalaei AkbariGhent University
Zihan WeiGhent University
Jie HuTaiyuan University of Technology
Francis VerpoortGhent University
Serge ZhuiykovNorth University of China

Films

Plasma SnO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TDMASn, (Me2N)4Sn, [(CH3)2N]4Sn, Tetrakis(DiMethylAmido) Tin, Tin Dimethylamide
CAS#: 1066-77-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Plasma In2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
In(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) indium
CAS#: 34269-03-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000DI

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Discover

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL JSM-7800F

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: JPK Nanowizard III Ultra

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Rigaku

Characteristic: Raman Shift
Analysis: Raman Spectroscopy
Diagnostic: Horiba Jobin Yvon LabRAM HR800 Raman Spectroscope

Substrates

Au
SnO2

Notes

1731