Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

In(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) indium, CAS# 34269-03-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s).

NumberTitle
1On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
2Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
3Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films