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On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies

Type:
Journal
Info:
Scientific Reports 7:44581 (2017)
Date:
2017-02-10
DOI:
http://dx.doi.org/10.1038/srep44581

Author Information

Name Institution
Artur HermansGhent University
Clemens KieningerKarlsruhe Institute of Technology (KIT)
Kalle KoskinenTampere University of Technology
Andreas WickbergKarlsruhe Institute of Technology (KIT)
Eduardo SolanoGhent University
Jolien DendoovenGhent University
Martti KauranenGhent University
Stephane ClemmenGhent University
Martin WegenerKarlsruhe Institute of Technology (KIT)
Christian KoosKarlsruhe Institute of Technology (KIT)
Roel BaetsGhent University

Films

Plasma TiO2

Hardware used: Custom Remote Inductively Coupled Plasma
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 120C

Plasma Al2O3

Hardware used: Custom Remote Inductively Coupled Plasma
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 120C

Plasma In2O3

Hardware used: Custom Remote Inductively Coupled Plasma
In(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) indium
CAS#: 34269-03-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 120C

Film/Plasma Properties

Substrates

Glass

Notes

1105