Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films

Type:
Journal
Info:
J. Phys. Chem. C, 2015, 119 (21), pp 11786-11791
Date:
2015-05-08
DOI:
http://dx.doi.org/10.1021/acs.jpcc.5b03255

Author Information

Name Institution
Ranjith K. RamachandranGhent University
Jolien DendoovenGhent University
Hilde PoelmanGhent University
Christophe DetavernierGhent University

Films

Plasma In2O3

Hardware used: Custom
In(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) indium
CAS#: 34269-03-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 100-400C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: VG Scientific ESCALAB 220iXL

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Bruker D8 Discover

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Dimension Edge

Characteristic: Optical Properties
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Transmittance
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: -

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: Hiden Analytical QMS

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Discover

Characteristic: Thickness
Analysis: XRF, X-Ray Fluorescence
Diagnostic: Bruker D8 Discover

Characteristic: Conformality, Step Coverage
Analysis: XRF, X-Ray Fluorescence
Diagnostic: Bruker D8 Discover

Substrates

SiO2

Notes

352