Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
Info:
Coatings 2020, 10, 692
Author Information
| Name |
Institution |
| Jong Hyeon Won | Seoul National University of Science and Technology |
| Seong Ho Han | Korea Research Institute of Chemical Technology |
| Bo Keun Park | Korea Research Institute of Chemical Technology |
| Taek-Mo Chung | Korea Research Institute of Chemical Technology |
| Jeong Hwan Han | Seoul National University of Science and Technology |
Films
Film/Plasma Properties
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: SIMS, Secondary Ion Mass Spectrometry
Analysis: UV-VIS Spectroscopy
Analysis: UV-VIS Spectroscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Analysis: Hall Measurements
Analysis: Hall Measurements
Analysis: Hall Measurements
Substrates
Notes