About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Understanding and Eliminating Hysteresis for Highly Efficient Planar Perovskite Solar Cells

Type:
Journal
Info:
Advanced Energy Materials Volume 7, Issue 17, 2017
Date:
2017-03-22
DOI:
http://dx.doi.org/10.1002/aenm.201700414

Author Information

Name Institution
Changlei WangUniversity of Toledo
Chuanxiao XiaoNational Renewable Energy Laboratory
Yue YuUniversity of Toledo
Dewei ZhaoUniversity of Toledo
Rasha A. AwniUniversity of Toledo
Corey R. GriceUniversity of Toledo
Kiran GhimireUniversity of Toledo
Iordania ConstantinouUniversity of Heidelberg
Weiqiang LiaoUniversity of Toledo
Alexander CimaroliUniversity of Toledo
Pei LiuWuhan University
Jing ChenSoutheast University
Nikolas J. PodrazaUniversity of Toledo
Chun-Sheng JiangNational Renewable Energy Laboratory
Mowafak M. Al-JassimNational Renewable Energy Laboratory
Xingzhong ZhaoWuhan University
Yanfa YanUniversity of Toledo

Films

Plasma SnO2

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

FTO, F:SnO2

Notes

1042