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Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma

Type:
Journal
Info:
Materials Letters, Volume 166, Pages 163 - 166
Date:
2015-12-10
DOI:
http://dx.doi.org/10.1016/j.matlet.2015.12.049

Author Information

Name Institution
Dong-Kwon LeePusan National University
Zhixin WanPusan National University
Jong-Seong BaeKorean Basic Science Institute
Han-Bo-Ram LeeIncheon National University
Ji-Hoon AhnKorea Maritime and Ocean University
Sangdeok KimHynix Semiconductor
Ja-Yong KimHynix Semiconductor
Se-Hun KwonPusan National University

Films

Plasma SnO2

Hardware used: iOV d100, iSAC Co. Ltd.
Tin Tetrachloride, SnCl4
CAS#: 7646-78-8
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 150-350C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam alpha-SE

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam alpha-SE

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: Rigaku Ultima IV

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance
Diagnostic: Ecopia HMS-3000

Characteristic: Mobility
Analysis: van der Pauw sheet resistance
Diagnostic: Ecopia HMS-3000

Characteristic: Carrier Concentration
Analysis: van der Pauw sheet resistance
Diagnostic: Ecopia HMS-3000

Characteristic: Corrosion Potential
Analysis: Potentiodynamic Polarization Test
Diagnostic: Princeton Applied Research VersaSTAT4

Characteristic: Corrosion Current Density
Analysis: Potentiodynamic Polarization Test
Diagnostic: Princeton Applied Research VersaSTAT4

Substrates

Si(100)
Corning XG Glass
Stainless Steel 316L

Notes

519