About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Han-Bo-Ram Lee Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Han-Bo-Ram Lee returned 21 record(s).

NumberTitle
1Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
2Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
3Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
4In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
5Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
6Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
7A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
8Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
9Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
10Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
11Formation of Ni silicide from atomic layer deposited Ni
12Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
13Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
14Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
15Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
16Plasma-enhanced atomic layer deposition of Co on metal surfaces
17Plasma-Enhanced Atomic Layer Deposition of Ni
18Very high frequency plasma reactant for atomic layer deposition
19Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
20High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
21Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2