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Plasma-enhanced atomic layer deposition of Co on metal surfaces

Type:
Journal
Info:
Surface & Coatings Technology 264 (2015) 60-65
Date:
0000-00-00
DOI:
https://doi.org/10.1016/j.surfcoat.2015.01.019

Author Information

Name Institution
Jaehong YoonYonsei University
Jeong-Gyu SongYonsei University
Hyunjun KimYonsei University
Han-Bo-Ram LeeIncheon National University

Films

Plasma Co

Hardware used: Quros Plus 150
cobaltacene, bis(cyclopentadienyl)cobalt, Cp2Co
CAS#: 1277-43-6
H2, Hydrogen
CAS#: 1333-74-0
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Magnetic Properties
Analysis: VSM, Vibrating Sample Magnetometer
Diagnostic: -

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: -

Substrates

Si(001)
SiO2
Ru
Ta

Notes

1589