About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells

Type:
Journal
Info:
J. Mater. Chem. A, 2016, 4, 12080-12087
Date:
2016-07-09
DOI:
http://dx.doi.org/10.1039/C6TA04503K

Author Information

Name Institution
Changlei WangUniversity of Toledo
Dewei ZhaoUniversity of Toledo
Corey R. GriceUniversity of Toledo
Weiqiang LiaoUniversity of Toledo
Yue YuUniversity of Toledo
Alexander CimaroliUniversity of Toledo
Niraj ShresthaUniversity of Toledo
Paul J. RolandUniversity of Toledo
Jing ChenSoutheast University
Zhenhua YuWuhan University
Pei LiuWuhan University
Yan ChengWuhan University
Randy J. EllingsonUniversity of Toledo
Xingzhong ZhaoWuhan University
Yanfa YanUniversity of Toledo

Films

Plasma SnO2

Hardware used: Ensure LabNano PE
TDMASn, (Me2N)4Sn, [(CH3)2N]4Sn, Tetrakis(DiMethylAmido) Tin, Tin Dimethylamide
CAS#: 1066-77-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 50-200C

Film/Plasma Properties

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Diagnostic: Horiba Symphony-II

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000FI

Characteristic: Open Circuit Voltage
Analysis: Custom
Diagnostic: Custom

Characteristic: Short Circuit Current
Analysis: Custom
Diagnostic: Custom

Characteristic: Fill Factor
Analysis: Custom
Diagnostic: Custom

Characteristic: Efficiency
Analysis: Custom
Diagnostic: Custom

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Veeco Instruments Nanoscope V

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Lucas Labs PRO4-440N

Substrates

ITO
FTO, F:SnO2

Notes

874