Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
Info:
AIP ADVANCES 9, 045019 (2019)
Author Information
Films
Film/Plasma Properties
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Analysis: GDOES, Glow Discharge Optical Emission Spectroscopy
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Analysis: DSC, Differential Scanning Calorimetry
Analysis: TGA, Thermo Gravimetric Analysis
Substrates
Notes
| Nice compilation of In2O3 ALD precursor references. |
| 1285 |