About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets

Type:
Journal
Info:
Flex. Print. Electron. 2 (2017) 022001
Date:
2017-04-03

Author Information

Name Institution
Ming FangBeijing Institute of Graphic Communication
H ZhangBeijing Institute of Graphic Communication
Lijun SangBeijing Institute of Graphic Communication
H CaoBeijing Institute of Graphic Communication
Lizhen YangBeijing Institute of Graphic Communication
K OstrikovQueensland University of Technology
I LevchenkoQueensland University of Technology
Qiang ChenBeijing Institute of Graphic Communication

Films

Other Al2O3

Hardware used: Custom

CAS#: 7782-44-7


CAS#: 7732-18-5

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Wetting Angle
Analysis: Contact Angle Measurement

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Diffusion Barrier Properties
Analysis: Water Vapor Transmission Rate (WVTR)

Substrates

PET, Polyethylene Terephthalate
Si(100)

Notes

1018