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HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Journal of Alloys and Compounds, Volume 859, 2021, Pages 157875
Date:
2020-11-09
DOI:
https://doi.org/10.1016/j.jallcom.2020.157875

Author Information

Name Institution
Chaoyi YinChinese Academy of Sciences
Meiping ZhuChinese Academy of Sciences
Tingting ZengChinese Academy of Sciences
Chen SongChinese Academy of Sciences
Yingjie ChaiUniversity of Central Florida
Yuchuan ShaoChinese Academy of Sciences
Rongjun ZhangFudan University
Jiaoling ZhaoChinese Academy of Sciences
Dawei LiChinese Academy of Sciences
Jianda ShaoChinese Academy of Sciences

Films

Plasma SiO2

Hardware used: Picosun R200
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 50-200C

Plasma HfO2

Hardware used: Picosun R200
TEMAHf, tetrakis(ethylmethylamido) Hafnium, hafnium ethylmethylamide, (EtMeN)4Hf
CAS#: 352535-01-4
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 50-200C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Characteristic: Light Scattering
Analysis: Custom
Diagnostic: Custom

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: PANalytical Empyrean

Characteristic: Optical Absorption
Analysis: Custom
Diagnostic: Custom

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Reflectance Spectra
Analysis: UV-VIS Spectroscopy
Diagnostic: Perkin-Elmer lambda 1050 UV/Vis/NIR

Characteristic: Laser Induced Damage Threshold, LIDT
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Zeiss AURIGA Cross-beam SEM-FIB

Substrates

SiO2
Glass, BK7

Notes

1574