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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

A high-density carbon fiber neural recording array technology

Type:

Journal

Info:

Journal of Neural Engineering, Volume 16, Number 1

Date:

2018-10-16

DOI:

http://dx.doi.org/10.1088/1741-2552/aae8d9

Author Information

Name	Institution
Travis L. Massey	University of California - Berkeley
Samantha R. Santacruz	University of California - Berkeley
Jason F. Hou	University of California - Berkeley
Kristofer S. J. Pister	University of California - Berkeley
Jose M. Carmena	University of California - Berkeley
Michel M. Maharbiz	University of California - Berkeley

Films

Plasma TiN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji

Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

SiO₂

Notes

1409