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Biofilm prevention on cochlear implants

Type:
Journal
Info:
Cochlear Implants International, Volume 15, Issue 3 (May, 2014), pp. 173-178
Date:
2014-03-28
DOI:
http://dx.doi.org/10.1179/1754762813Y.0000000061

Author Information

Name Institution
Yael GoldfingerBar Ilan University
Michal NatanBar Ilan University
Chaim N. SukenikBar Ilan University
Ehud BaninBar Ilan University
Jona KronenbergTel Aviv University

Films

Plasma TiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Inspect

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker AXS ICON

Substrates

PDMS

Notes

Cambridge NanoTech Fiji PEALD TiO2 cochlear implant biofilm prevention study.
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