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Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops

Type:
Journal
Info:
Ultramicroscopy Volume 166, July 2016, Pages 39-47
Date:
2016-04-08
DOI:
https://doi.org/10.1016/j.ultramic.2016.04.003

Author Information

Name Institution
Timothy S. EnglishStanford University
J ProvineStanford University
Ann F. MarshallStanford University
Ai Leen KohStanford University
Thomas W. KennyStanford University

Films

Plasma Pt

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt
CAS#: 94442-22-5
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Titan

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Substrates

Notes

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