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Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition

Type:
Poster
Info:
ALD 2012 Poster
Date:
2012-06-18
DOI:
No DOI

Author Information

Name Institution
Guo LiuCambridge NanoTech
Eric W. DegunsCambridge NanoTech
Ganesh M. SundaramCambridge NanoTech
Jill S. BeckerCambridge NanoTech

Films

Plasma Ni

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Nickel bis(N,N'-ditertialbutylacetamidinate), Dow Chemical AccuDEPTM Nickel
CAS#: 940895-79-4
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range N/A

Plasma Fe

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Bis(N,N'-di-t-butylacetamidinato)iron(II)
CAS#: 635680-56-7
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry
Diagnostic: -

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: -

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Substrates

SiO2

Notes

127