Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Nickel bis(N,N'-ditertialbutylacetamidinate), Dow Chemical AccuDEPTM Nickel, CAS# 940895-79-4

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition