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Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application

Type:
Journal
Info:
J. Vac. Sci. Technol. A 30(1), Jan/Feb 2012
Date:
2011-10-17
DOI:
http://dx.doi.org/10.1116/1.3669521

Author Information

Name Institution
Xiaohui TangUniversite catholique de Louvain (UCL)
Laurent A. FrancisUniversite catholique de Louvain (UCL)
P. SimonisFacultés Universitaires Notre-Dame de la Paix
M. HaslingerUniversite catholique de Louvain (UCL)
R. DelamareUniversite catholique de Louvain (UCL)
O. DeschaumeUniversite catholique de Louvain (UCL)
Denis FlandreUniversite catholique de Louvain (UCL)
P. DefranceUniversite catholique de Louvain (UCL)
A. M. JonasUniversite catholique de Louvain (UCL)
J. P. VigneronFacultés Universitaires Notre-Dame de la Paix
Jean-Pierre RaskinUniversite catholique de Louvain (UCL)

Films

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 25-250C

Film/Plasma Properties

Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements
Diagnostic: -

Characteristic: Minority Carrier Lifetime
Analysis: QSSPC, Quasi-Steady-State PhotoConductance Decay
Diagnostic: -

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Substrates

Silicon
Butterfly Wing

Notes

Ultratech Fiji PEALD Al2O3 for silicon solar cell passivation layer and butterfly wing-like anti-reflection structure.
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