Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
Info:
Journal of Vacuum Science & Technology A 39, 053408 (2021)
Author Information
Films
Film/Plasma Properties
Analysis: XRD, X-Ray Diffraction
Analysis: XRD, X-Ray Diffraction
Analysis: XRR, X-Ray Reflectivity
Analysis: XRR, X-Ray Reflectivity
Analysis: Four-point Probe
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: Reciprocating Sliding Test
Analysis: Reciprocating Sliding Test
Analysis: AFM, Atomic Force Microscopy
Substrates
Notes