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ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors

Type:
Journal
Info:
Sensors and Actuators A: Physical, Vol. 240, 160 - 166 (2016)
Date:
2016-01-26

Author Information

Name Institution
Emmaline KaoUniversity of California - Berkeley
Chen YangUniversity of California - Berkeley
Roseanne WarrenUniversity of California - Berkeley
Alina KozindaUniversity of California - Berkeley
Liwei LinUniversity of California - Berkeley

Films

Plasma TiN


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Capacitance
Analysis: CV, Cyclic Voltammetry

Substrates

CNTs, Carbon NanoTubes

Notes

801