Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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A fully integrated electronic platform for multiplexed intermolecular force spectroscopy

Type:
Conference Proceedings
Info:
2017 19th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS)
Date:
2017-06-01
DOI:
http://dx.doi.org/10.1109/TRANSDUCERS.2017.7994381

Author Information

Name Institution
Samyuktha ChallaStanford University
Salmonn TalebiStanford University
Ronald W. DavisStanford University
Mehdi JavanmardStanford University
Sam EmaminejadStanford University

Films

Plasma SiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

1158