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Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements

Type:
Journal
Info:
Optics Express, v. 24, n. 7, p. 7654--7669 (2016)
Date:
2016-02-29
DOI:
http://dx.doi.org/10.1364/OE.24.007654

Author Information

Name Institution
Luis MeloUniversity of Victoria
Geoff BurtonUniversity of Victoria
Philip KubikSimon Fraser University
Peter WildUniversity of Victoria

Films

Plasma HfO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TDMAHf, tetrakis(dimethylamido)hafnium, hafnium dimethylamide, (Me2N)4Hf, also CAS# 19782-68-4
CAS#: 19962-11-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 150C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Substrates

Silicon

Notes

Available as section 3.3 in on-line thesis.
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