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Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces

Type:
Journal
Info:
Advanced Functional Materials Volume 24, Issue 46, pages 7381-7389, December 10, 2014
Date:
2014-10-01
DOI:
http://dx.doi.org/10.1002/adfm.201401794

Author Information

Name Institution
Philip SchulzPrinceton University
Leah L. KellyUniversity of Arizona
Paul WingetGeorgia Institute of Technology
Hong LiGeorgia Institute of Technology
Hyungchul (GaTech) KimGeorgia Institute of Technology
Paul F. NdioneNational Renewable Energy Laboratory
Ajaya K. SigdelNational Renewable Energy Laboratory
Joseph J. BerryNational Renewable Energy Laboratory
Samuel Graham Jr.Georgia Institute of Technology
Jean-Luc BrédasGeorgia Institute of Technology
Antoine KahnPrinceton University
Oliver L. A. MontiUniversity of Arizona

Films

Plasma ZnO

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku D/Max-2500

Substrates

IZO, Indium Zinc Oxide

Notes

Ultratech Fiji PEALD ZnO for hybrid organic/inorganic electrode interface study.
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