About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes

Type:
Journal
Info:
Biosensors and Bioelectronics Available online 7 August 2014
Date:
2014-07-31
DOI:
http://dx.doi.org/10.1016/j.bios.2014.07.084

Author Information

Name Institution
Numa CouniotUniversite catholique de Louvain (UCL)
T. VanzieleghemUniversite catholique de Louvain (UCL)
J. RassonUniversite catholique de Louvain (UCL)
N. Van Overstraeten-SchlögelUniversite catholique de Louvain (UCL)
Olivier PonceletUniversite catholique de Louvain (UCL)
J. MahillonUniversite catholique de Louvain (UCL)
Laurent A. FrancisUniversite catholique de Louvain (UCL)
Denis FlandreUniversite catholique de Louvain (UCL)

Films

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 25C

Film/Plasma Properties

Substrates

Al
Pyrex

Notes

Ultratech Fiji room temperature PEALD Al2O3 for point of care bacteria detection diagnostic microelectrode passivation.
161