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Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

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Programmable on-chip DNA compartments as artificial cells

Type:
Journal
Info:
Science Vol. 345 no. 6198 pp. 829-832
Date:
2014-07-16
DOI:
http://dx.doi.org/10.1126/science.1255550

Author Information

Name Institution
Eyal KarzbrunWeizmann Institute of Science
Alexandra M. TayarWeizmann Institute of Science
Vincent NoireauxUniversity of Minnesota
Roy H. Bar-ZivWeizmann Institute of Science

Films

Plasma SiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

Ultratech/Cambridge NanoTech Fiji PEALD SiO2 for programmable DNA compartment study.
SiO2 deposition only discussed in supplementary materials.
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