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Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties

Type:
Journal
Info:
Physica Status Solidi (a)
Date:
2015-11-06

Author Information

Name Institution
Loïc BaggettoCentre Inter-universitaire de Recherche et d'Ingéniérie des Matériaux (CIRIMAT)
Cédric CharvillatCentre Inter-universitaire de Recherche et d'Ingéniérie des Matériaux (CIRIMAT)
Yannick ThébaultCentre Inter-universitaire de Recherche et d'Ingéniérie des Matériaux (CIRIMAT)
Jérôme EsvanCentre Inter-universitaire de Recherche et d'Ingéniérie des Matériaux (CIRIMAT)
Marie-Christine LafontCentre Inter-universitaire de Recherche et d'Ingéniérie des Matériaux (CIRIMAT)
Emmanuel ScheidLaboratoire d'Analyse et d'Architecture des Systèmes (LAAS)
Gabriel M. VeithOak Ridge National Laboratory
Constantin VahlasCentre Inter-universitaire de Recherche et d'Ingéniérie des Matériaux (CIRIMAT)

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: Optical Reflectivity

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Substrates

Silicon
Ti

Notes

424