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Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties

Type:
Journal
Info:
Chem. Mater. 2022, 34, 6142-6154
Date:
2022-06-15

Author Information

Name Institution
Matthias FilezGhent University
Ji-Yu FengGhent University
Matthias M. MinjauwGhent University
Eduardo SolanoALBA Synchrotron Light Source, NCD-SWEET Beamline
Nithin PoonkottilGhent University
Michiel Van DaeleGhent University
Ranjith K. RamachandranGhent University
Chen LiUniversity of Antwerp
Sara BalsUniversity of Antwerp
Hilde PoelmanGhent University
Christophe DetavernierGhent University
Jolien DendoovenGhent University

Films

Plasma PdRu


Film/Plasma Properties

Characteristic: Nucleation
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering

Characteristic: Chemical Composition, Impurities
Analysis: XRF, X-Ray Fluorescence

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIWAXS, Grazing Incidence Wide Angle X-ray Scattering

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy

Substrates

Si with native oxide
Si3N4

Notes

1740