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Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition

Type:
Journal
Info:
Acta Metallurgica Sinica (English Letters) (2019) 32:1530-1536
Date:
2019-07-25
DOI:
https://www.amse.org.cn/EN/10.1007/s40195-019-00938-8

Author Information

Name Institution
Yingfeng HeUniversity of Science and Technology Beijing
Meiling LiUniversity of Science and Technology Beijing
Sanjie LiuUniversity of Science and Technology Beijing
Huiyun WeiUniversity of Science and Technology Beijing
Huan-Yu YeUniversity of Science and Technology Beijing
Yimeng SongUniversity of Science and Technology Beijing
Peng QiuUniversity of Science and Technology Beijing
Yunlai AnUniversity of Science and Technology Beijing
Mingzeng PengUniversity of Science and Technology Beijing
Xinhe ZhengUniversity of Science and Technology Beijing

Films

Plasma GaN

Hardware used: Angstrom-dep III PEALD
TEG, triethyl galium, GaEt3
CAS#: 1115-99-7
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 350C

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Veeco Dimension 3100

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: VG Scientific ESCALAB 250

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Rigaku Smartlab

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Rigaku Smartlab

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Rigaku Smartlab

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku Smartlab

Characteristic: Stress
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku Smartlab

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 2200FS

Characteristic: Nucleation
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 2200FS

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Diagnostic: Horiba Jobin Yvon LabRAM HR800 Raman Spectroscope

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Diagnostic: Horiba Jobin Yvon LabRAM HR800 Raman Spectroscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Diagnostic: JEOL 2200FS

Substrates

Graphene
SiO2
Silicon

Notes

1609