About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition

Type:
Conference Proceedings
Info:
2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)
Date:
2016-01-25

Author Information

Name Institution
Golnaz KarbasianUniversity of Notre Dame
Alexei P. OrlovUniversity of Notre Dame
A. S. MukasyanUniversity of Notre Dame
Gregory L. SniderUniversity of Notre Dame

Films

Plasma SiNx


Film/Plasma Properties

Substrates

SiO2
Ni

Notes

816