About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2, CAS# 27804-64-4

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 45 record(s).

NumberTitle
1Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
2Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
3Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
4Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
5Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
6Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
7Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
8Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
9A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
10Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
11Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
12Breakdown and Protection of ALD Moisture Barrier Thin Films
13Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
14Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
15Energy-enhanced atomic layer deposition for more process and precursor versatility
16Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
17Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
18Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
19Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
20'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
21On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
22Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
23Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
24Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
25Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
26Designing high performance precursors for atomic layer deposition of silicon oxide
27PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
28Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
29Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
30Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
31Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
32High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
33Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
34Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
35Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
36Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
37Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
38Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
39Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
40Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
41Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
42Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
43Comparative study of ALD SiO2 thin films for optical applications
44Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
45Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications