PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2018, 10 (8), pp 7422-7434
Date:
2018-01-17
Author Information
| Name | Institution |
|---|---|
| Maximilian Gebhard | Ruhr-University Bochum |
| Lukas Mai | Ruhr-University Bochum |
| Lars Banko | Ruhr-University Bochum |
| Felix Mitschker | Ruhr-University Bochum |
| Christian Hoppe | University of Paderborn |
| Montgomery Jaritz | RWTH Aachen University |
| Dennis Kirchheim | RWTH Aachen University |
| Christoph Zekorn | RWTH Aachen University |
| Teresa de los Arcos | University of Paderborn |
| Dario Grochla | Ruhr-University Bochum |
| Rainer Dahlmann | RWTH Aachen University |
| G. Grundmeier | University of Paderborn |
| Peter Awakowicz | Ruhr-University Bochum |
| Alfred Ludwig | Ruhr-University Bochum |
| Anjana Devi | Ruhr-University Bochum |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Stress
Analysis: -
Characteristic: Damage, Defects
Analysis: -
Characteristic: Oxygen Transmission Rate (OTR)
Analysis: -
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Si(100) |
| Polypropylene |
Notes
| 1107 |