Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
Info:
ACS Appl. Mater. Interfaces, 2017, 9 (29), pp 24722-24730
Author Information
Films
Film/Plasma Properties
Analysis: Four-point Probe
Analysis: AFM, Atomic Force Microscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: XRD, X-Ray Diffraction
Analysis: XRR, X-Ray Reflectivity
Analysis: TEM, Transmission Electron Microscope
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Analysis: TEM, Transmission Electron Microscope
Analysis: HAADF, High-Angle Annular Dark Field
Substrates
Notes